Imprint apparatus and imprint method

It is possible to perform even pattern transfer with a high throughput. An imprint apparatus includes: a first press plate having a first press face on which a substrate to be transferred; a second press plate having a second press face opposed to the first press face, which is arranged such that th...

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Bibliographic Details
Main Authors TAKAHASHI RYOUICHI, SAKURAI MASATOSHI
Format Patent
LanguageEnglish
Published 19.08.2008
Subjects
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
LINING MACHINES
PERFORMING OPERATIONS
PHYSICS
PRINTING
PRINTING MACHINES OR PRESSES
STAMPS
TRANSPORTING
TYPEWRITERS
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Summary:It is possible to perform even pattern transfer with a high throughput. An imprint apparatus includes: a first press plate having a first press face on which a substrate to be transferred; a second press plate having a second press face opposed to the first press face, which is arranged such that the second press face presses a face of an imprint stamper which is opposed from a face thereof on which a concave and convex pattern is formed; a pressure applying unit which applies a pressure on a face of the second press plate which is opposed from the second press face; a first supporting member which supports a face of the first press plate which is opposed from the first press face and has a section equal to or smaller than a bottom face of the substrate in size; and a frame structure which has a second supporting member supporting the first supporting member, a third supporting member supporting the pressure applying unit, and coupling members coupling respective both ends of the second supporting member and the third supporting member.
Bibliography:Application Number: US20050085533