Segmented resist islands for photolithography on single sliders
A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders a...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
08.07.2008
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Subjects | |
Online Access | Get full text |
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Abstract | A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature. |
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AbstractList | A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature. |
Author | SUZUKI GARY MCKEAN DENNIS R LEE KIM Y HWANG CHERNGYE |
Author_xml | – fullname: HWANG CHERNGYE – fullname: LEE KIM Y – fullname: MCKEAN DENNIS R – fullname: SUZUKI GARY |
BookMark | eNqNyj0OAiEQBlAKLfy7w1zARhKM1SYajf1qvSHyLZDgDGFovL2NB7B6zVubBQtjZYYR8Q3uCNSgWTtlLZ6D0iyNapIuJfcksfmaPiRMmjkWkJYc0HRrlrMvit3PjaHb9XG571Flglb_AqNPz_FoT85Zdz7YP8oXmTAzOw |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US7396636B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US7396636B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 13:59:39 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US7396636B23 |
Notes | Application Number: US20040928038 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080708&DB=EPODOC&CC=US&NR=7396636B2 |
ParticipantIDs | epo_espacenet_US7396636B2 |
PublicationCentury | 2000 |
PublicationDate | 20080708 |
PublicationDateYYYYMMDD | 2008-07-08 |
PublicationDate_xml | – month: 07 year: 2008 text: 20080708 day: 08 |
PublicationDecade | 2000 |
PublicationYear | 2008 |
RelatedCompanies | HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS, B.V |
RelatedCompanies_xml | – name: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS, B.V |
Score | 2.7126126 |
Snippet | A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | Segmented resist islands for photolithography on single sliders |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080708&DB=EPODOC&locale=&CC=US&NR=7396636B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1bS8MwFD6MeX3TqThv5EH6VqxNbbuHIvQyhrALbpW9jeYyV5B22Ip_35O4Tl_0NSWHNOTkfEm_7yvALc9cxjIqzKVrc9PJBKaUUoHwjFoI96mgWh49HLmD1HmaP8xbkDdaGO0T-qnNETGjOOZ7rffr9c8lVqy5ldUdy7GpfOzPgthoTsc-rmDfiMMgmYzjcWREUZBOjdFz4FHE9dQNcbfeUSha2ewnL6ESpax_V5T-EexOMFhRH0NLFh04iJofr3Vgf7j53t2BPU3Q5BU2bpKwOkF8LV-1laYgeFbGTiSvtGKXIAAl61VZK07bauNFTcqCqPuAN0kQUira8imQfjKLBiaOabF9_0U63Y6enkG7KAt5DoSKJVZfz7eEJR33XvSWjiW5LWzeYwzreBe6f4a5-OfZJRx-cyI80_KvoF2_f8hrLLw1u9FT9gWwQYk- |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3PT4MwFH5Z5o95U9Q4f_ZguBFxRWAHYgJsQR3b4sDstkBb3BIDi2D8933UbXrRa5s2bdPX9732-14BrllipmlCuZaZHaYZCUeTqlUgLKE6wn3KqZRHh0MziI3H6d20AYu1FkbmCf2UyRHRohjaeyXP6-XPJZYvuZXlTbrAouK-Hzm-uo6ObdzBtuq7Tm888kee6nlOPFGHz45FEddT08XTesvCiFBGSi9uLUpZ_vYo_X3YHmNneXUADZEr0PLWH68psBuu3rsV2JEETVZi4coIy0PE1-JVptLkBGNlbEQWpVTsEgSgZDkvqprTNl_loiZFTur7gDdBEFLWtOUjIP1e5AUajmm2mf8snmxGT4-hmRe5OAFCeYbe17J1rgvDvOXdzNAF6_AO66Yp-vE2tP_s5vSfuitoBVE4mA0ehk9nsPfNj7A03T6HZvX-IS7QCVfppVy-L0ACjCg |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Segmented+resist+islands+for+photolithography+on+single+sliders&rft.inventor=HWANG+CHERNGYE&rft.inventor=LEE+KIM+Y&rft.inventor=MCKEAN+DENNIS+R&rft.inventor=SUZUKI+GARY&rft.date=2008-07-08&rft.externalDBID=B2&rft.externalDocID=US7396636B2 |