Segmented resist islands for photolithography on single sliders
A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders a...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
08.07.2008
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Subjects | |
Online Access | Get full text |
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Summary: | A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature. |
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Bibliography: | Application Number: US20040928038 |