System and method for fabrication and replication of diffractive optical elements for maskless lithography

A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of...

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Bibliographic Details
Main Authors GOODBERLET JAMES G, CARTER DAVID J, HASTINGS JEFFREY T, MENON RAJESH, GIL DARIO, SMITH HENRY I
Format Patent
LanguageEnglish
Published 25.03.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CONVERSION OF CHEMICAL ELEMENTS
ELECTROGRAPHY
HOLOGRAPHIC PROCESSES OR APPARATUS
HOLOGRAPHY
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RADIOACTIVE SOURCES
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Summary:A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.
Bibliography:Application Number: US20030677173