Semiconductor device having a lateral MOSFET and combined IC using the same

A semiconductor device realizes a high electrostatic discharge withstanding capability and a high surge withstanding capability within the narrow chip area of a lateral MOSFET used in integrated intelligent switching devices, double-integration-type signal input and transfer IC's, and combined...

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Bibliographic Details
Main Authors FUJIHIRA TATSUHIKO, ICHIMURA TAKESHI, KUMAGAI NAOKI, YOSHIDA KAZUHIKO
Format Patent
LanguageEnglish
Published 24.07.2007
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Summary:A semiconductor device realizes a high electrostatic discharge withstanding capability and a high surge withstanding capability within the narrow chip area of a lateral MOSFET used in integrated intelligent switching devices, double-integration-type signal input and transfer IC's, and combined power IC's. The semiconductor device includes a vertical bipolar transistor in which a base is electrically connected to an emitter and a collector, and a lateral MOSFET including a drain electrode connected to a surface electrode. The vertical bipolar transistor absorbs electrostatic discharge or surge energy when a high electrostatic discharge voltage or a high surge voltage is applied and limits the electrostatic discharge voltage or the surge voltage to be lower than the breakdown voltage of the lateral MOSFET.
Bibliography:Application Number: US20050235415