Lithographic apparatus and device manufacturing method

• Main Authors: NEERHOF HENDRIK ANTONY JOHANNES, OTTENS JOOST JEROEN, GIESEN PETER THEODORUS MARIA, MOORS JOHANNES HUBERTUS JOSEPHINA, DE GROOF ADRIANUS MATHIJS MARIA, VAN ELP JAN, VAN ZWET ERWIN, KUIPERS LEO WILHELMUS MARIA, LE KLUSE MARCO
• Format: Patent
• Language: English
• Published: 17.07.2007
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; CORONA DEVICES; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES; GENERATION; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; OVERVOLTAGE ARRESTERS USING SPARK GAPS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPARK GAPS; SPARKING PLUGS

A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.