Non-contact mobile charge measurement with leakage band-bending and dipole correction

Corona charges are used to bias a wafer to push down mobile charges and then pull them up during temperature cycles. Mobile charge is measured from the drops in the corona voltage due to the mobile charges. Corrections are made in the measurements for dipole potentials, leakage and silicon band-bend...

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Bibliographic Details
Main Authors HORNER GREGORY S, HOWLAND WILLIAM H, FUNG MIN-SU, VERKUIL ROGER L
Format Patent
LanguageEnglish
Published 12.06.2007
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Summary:Corona charges are used to bias a wafer to push down mobile charges and then pull them up during temperature cycles. Mobile charge is measured from the drops in the corona voltage due to the mobile charges. Corrections are made in the measurements for dipole potentials, leakage and silicon band-bending.
Bibliography:Application Number: US20050210093