Method for producing a semiconductor package, with a rerouted electrode formed on a resin projection portion

An insulating layer ( 3 ) having an opening portion ( 3 a) at a position conformable to an electrode pad ( 2 ) is formed. Next, a resin projection portion ( 4 ) is formed on the insulating layer ( 3 ). Thereafter, a resist film is formed which has opening portions made in regions conformable to the...

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Main Authors KUROSAKA AKIHITO, SADAKATA NOBUYUKI, MASUMOTO KENJI, INABA MASATOSHI, MASUMOTO MUTSUMI, SUZUKI TAKANAO, OMINATO TADANORI, KAIZU MASAHIRO
Format Patent
LanguageEnglish
Published 02.01.2007
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Summary:An insulating layer ( 3 ) having an opening portion ( 3 a) at a position conformable to an electrode pad ( 2 ) is formed. Next, a resin projection portion ( 4 ) is formed on the insulating layer ( 3 ). Thereafter, a resist film is formed which has opening portions made in regions conformable to the opening portion ( 3 a), the resin projection portion ( 4 ) and the region sandwiched therebetween. A Cu plating layer ( 6 ) is formed by electrolytic copper plating, using the resist film as a mask.
Bibliography:Application Number: US20040949386