Tri-metal and dual-metal stacked inductors

A high performance inductor which has a relatively low sheet resistance that can be integrated within a semiconductor interconnect structure and can be used in RF applications, including RF CMOS and SiGe technologies, is provided. The inductor is either a dual-metal inductor including a first layer...

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Bibliographic Details
Main Authors GROVES ROBERT A, COOLBAUGH DOUGLAS D, EDELSTEIN DANIEL C, HE ZHONG-XIANG
Format Patent
LanguageEnglish
Published 31.10.2006
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SEMICONDUCTOR DEVICES
TRANSFORMERS
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Summary:A high performance inductor which has a relatively low sheet resistance that can be integrated within a semiconductor interconnect structure and can be used in RF applications, including RF CMOS and SiGe technologies, is provided. The inductor is either a dual-metal inductor including a first layer of metal which serves as an upper metal wire in the semiconductor structure and a second layer of metal located directly on top of the first layer of metal, or a tri metal inductor, which includes a third layer of metal located directly on top of the second layer of metal. No vias are located between the various metal layers of the inventive inductor.
Bibliography:Application Number: US20030707065