Lithographic apparatus and device manufacturing method

A sensor is used to detect luminescent radiation that is radiated from a reflector as a result of state changes induced by a beam of radiation being incident on an area of the reflector. The intensity of the luminescent radiation at particular wavelengths can be used to determine the intensity of th...

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Bibliographic Details
Main Author DIERICHS MARCEL MATHIJS THEODORE MARIE
Format Patent
LanguageEnglish
Published 19.09.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Summary:A sensor is used to detect luminescent radiation that is radiated from a reflector as a result of state changes induced by a beam of radiation being incident on an area of the reflector. The intensity of the luminescent radiation at particular wavelengths can be used to determine the intensity of the beam of radiation.
Bibliography:Application Number: US20030648787