Self-aligned corrosion stop for copper C4 and wirebond

An electrical structure including a substrate and an interconnect. The substrate includes an electrically conductive and corrosion resistant metallic layer on a metal layer. The interconnect is electrically coupled to the metallic layer. A top surface of the metallic layer is above a top surface of...

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Bibliographic Details
Main Authors STAMPER ANTHONY K, SAMBUCETTI CARLOS J, RUBINO JUDITH M, EDELSTEIN DANIEL C
Format Patent
LanguageEnglish
Published 25.07.2006
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Summary:An electrical structure including a substrate and an interconnect. The substrate includes an electrically conductive and corrosion resistant metallic layer on a metal layer. The interconnect is electrically coupled to the metallic layer. A top surface of the metallic layer is above a top surface of the substrate and a bottom surface of the metallic layer is in direct mechanical contact with a first portion of a top surface of the metal layer. The metal layer is unalloyed and includes a metal.
Bibliography:Application Number: US20040849459