Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements

• Main Authors: HRDINA KENNETH E, DAVIS, JR. CLAUDE L
• Format: Patent
• Language: English
• Published: 16.08.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; GLASS; HOLOGRAPHY; IRRADIATION DEVICES; JOINING GLASS TO GLASS OR OTHER MATERIALS; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR

The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system ( 36 ) for producing and directing an extreme ultraviolet soft x-ray radiation lambda from an extreme ultraviolet soft x-ray source ( 38 ); a mask stage ( 22 ) illuminated by the extreme ultraviolet soft x-ray radiation lambda produced by illumination stage and the mask stage ( 22 ) includes a pattern when illuminated by radiation lambda. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface ( 32 ) and printed media subject wafer which has a radiation sensitive surface.