Semiconductor device and method of fabricating the same

A semiconductor device includes a first interconnection, an interlayer insulation film covering the first interconnection a contact hole provided in the interlayer insulation film and reaching the first interconnection, a first barrier metal and a tungsten plug provided in the contact hole, an oxide...

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Bibliographic Details
Main Author SAKAI KATSUHISA
Format Patent
LanguageEnglish
Published 29.03.2005
Edition7
Subjects
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