Cleaning fluid and cleaning method for component of semiconductor-treating apparatus
A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt % ethylene glycol monobutyl ether, 0.5 wt % surfactant, and 9.5 wt % water. The content of an alkali metal i...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
19.10.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A cleaning solution is used to remove a byproduct derived from a decomposed substance of a process gas containing C and F. The cleaning solution contains 75 wt % N-methyl-2-pyrrolidone, 15 wt % ethylene glycol monobutyl ether, 0.5 wt % surfactant, and 9.5 wt % water. The content of an alkali metal in the cleaning solution is set to be less than 10 ppb. |
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Bibliography: | Application Number: US20000700704 |