Electron emission lithography apparatus and method using a selectively grown carbon nanotube
An electron emission lithography apparatus and method using a selectively grown carbon nanotube as an electron emission source, wherein the electron emission lithography apparatus includes an electron emission source installed within a chamber and a stage, which is separated from the electron emissi...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
21.09.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An electron emission lithography apparatus and method using a selectively grown carbon nanotube as an electron emission source, wherein the electron emission lithography apparatus includes an electron emission source installed within a chamber and a stage, which is separated from the electron emission source by a predetermined distance and on which a sample is mounted, and wherein the electron emission source is a carbon nanotube having electron emission power. Since a carbon nanotube is used as an electron emission source, a lithography process can be performed with a precise critical dimension that prevents a deviation from occurring between the center of a substrate and the edge thereof and may realize a high throughput. |
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Bibliography: | Application Number: US20020160102 |