Immersion lithography
Apparatus, methods, and systems for immersion lithography. In one implementation, a hemispherical lens element is positioned near a target surface covered by photoresist. An immersion liquid is juxtaposed between the target surface and the lens element. A projected light is directed through the lens...
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Main Author | |
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Format | Patent |
Language | English |
Published |
24.08.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | Apparatus, methods, and systems for immersion lithography. In one implementation, a hemispherical lens element is positioned near a target surface covered by photoresist. An immersion liquid is juxtaposed between the target surface and the lens element. A projected light is directed through the lens element and the immersion liquid to image a mask on the target surface. |
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Bibliography: | Application Number: US20020335205 |