Polymers, resist compositions and patterning process
A copolymer of an acrylate monomer containing fluorine at alpha-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitiv...
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Main Authors | , , , , , , , , , , |
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Format | Patent |
Language | English |
Published |
23.03.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A copolymer of an acrylate monomer containing fluorine at alpha-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing. |
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Bibliography: | Application Number: US20020068298 |