Inspecting method and apparatus for repeated micro-miniature patterns

• Main Authors: SUGIMOTO ARITOSHI, TAGUCHI JUNICHI, INOUE YUKO, WATANABE TETSUYA, SHINKE WAKANA, IKOTA MASAMI
• Format: Patent
• Language: English
• Published: 09.12.2003
• Edition: 7
• Subjects: CALCULATING; COMPUTING; COUNTING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

An apparatus for inspecting foreign matter in repeated micro-miniature patterns formed upon a surface of an object to be inspected, comprising: an inspection light illuminating device for irradiating an inspection light directed upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; a scattered light detector for detecting scattered light of the inspection light being scattered upon the surface said object to be inspected; means for obtaining a first information related to a foreign matter attaching upon the surface of said object to be inspected, which is obtained on a basis of the detection of said scattered light by said scattered light detector; an illumination means for applying a bright field illumination upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; means for picking up the image of the foreign matter, under a bright field illumination by said illumination means; means for obtaining a second information related to said foreign matter, depending upon an image of said foreign matter, which is obtained on a basis of said picking up of the image by said image picking up means under the bright field illumination; and means for displaying said first information and said second information, both being related to said foreign matter, on a display screen thereof.