Position measuring method and position measuring system using the same
A position measuring method and a position measuring system using the same are disclosed. Plural marks of different linewidths are formed at different locations on an object to be measured, and the plural marks are detected, at the different locations and with different focus states. For determinati...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
28.10.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A position measuring method and a position measuring system using the same are disclosed. Plural marks of different linewidths are formed at different locations on an object to be measured, and the plural marks are detected, at the different locations and with different focus states. For determination of a measurement mark, such a mark among the plural marks as having a linewidth with which a change in focus characteristic, at the different locations, is smallest, is selected, and then the position measurement is performed to the object by using the determined measurement mark. |
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Bibliography: | Application Number: US20000666483 |