Irradiation control method and apparatus for pulsed light source used in exposure apparatus

A pulsed light source irradiation control method that irradiates a pulsed beam on an illumination subject includes the steps of measuring the energy of a pulsed beam having a predetermined oscillation frequency emitted from the pulsed light source, determining the actual oscillation frequency of the...

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Bibliographic Details
Main Author GO MASATO
Format Patent
LanguageEnglish
Published 05.08.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A pulsed light source irradiation control method that irradiates a pulsed beam on an illumination subject includes the steps of measuring the energy of a pulsed beam having a predetermined oscillation frequency emitted from the pulsed light source, determining the actual oscillation frequency of the emitted pulsed beam in accordance with the number of pulses of the pulsed beam, and adjusting the energy of the pulsed beam when the actual oscillation frequency differs from the predetermined oscillation frequency.
Bibliography:Application Number: US20000579740