System and method for providing a lithographic light source for a semiconductor manufacturing process
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
22.04.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Abstract | A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume. |
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AbstractList | A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume. |
Author | CALIA VINCENT S GUTOWSKI ROBERT M HAAS EDWIN G |
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Notes | Application Number: US20010760340 |
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RelatedCompanies | ADVANCED ENERGY SYSTEMS, INC |
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Snippet | A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES X-RAY TECHNIQUE |
Title | System and method for providing a lithographic light source for a semiconductor manufacturing process |
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