High precision alignment of optical waveguide features

A method of manufacturing a planar or integrated optical circuit in which a core layer (20) is formed on a substrate (10) and patterned to define optical features (such as waveguides) using a mask having a first portion (30) defining the desired core patterns (20a) and a second portion (35) correspo...

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Bibliographic Details
Main Author BEGUIN ALAIN M. J
Format Patent
LanguageEnglish
Published 15.04.2003
Edition7
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:A method of manufacturing a planar or integrated optical circuit in which a core layer (20) is formed on a substrate (10) and patterned to define optical features (such as waveguides) using a mask having a first portion (30) defining the desired core patterns (20a) and a second portion (35) corresponding to one or more alignment marks (20b). After etching the core layer, only the first portion (30) of the mask is removed, the second portion (35) of the mask being left to provide alignment marks (20b) which are highly visible through the subsequently-deposited overclad layer (40). The alignment marks (20b) are very accurately positioned with respect to the core patterns (20a), thus enabling further optical devices to be overlaid on the existing structure with accurate alignment to the underlying core patterns. The mask material (35) left on the alignment marks (20b) may be partially oxidized before the overclad is deposited.
Bibliography:Application Number: US20000735774