Pattern formation method and pattern formation material
The pattern formation material of this invention includes a base polymer having a unit represented by the following General Formula 1:General Formula 1:wherein R0 is an alkyl group; R1 is a group that is decomposed through irradiation of light; and R3 and R4 are the same or different and selected fr...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
11.03.2003
|
Edition | 7 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The pattern formation material of this invention includes a base polymer having a unit represented by the following General Formula 1:General Formula 1:wherein R0 is an alkyl group; R1 is a group that is decomposed through irradiation of light; and R3 and R4 are the same or different and selected from the group consisting of hydrogen and compounds including hydrogen and carbon. |
---|---|
Bibliography: | Application Number: US20000592937 |