Bipolar transistor manufacturing method

A method of manufacturing a bipolar transistor in an N-type semiconductor substrate, including the steps of depositing a first base contact polysilicon layer and doping it; depositing a second silicon oxide layer; forming in the first and second layers an opening; annealing to form a third thin oxid...

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Bibliographic Details
Main Authors GRIS YVON, TROILLARD GERMAINE
Format Patent
LanguageEnglish
Published 14.01.2003
Edition7
Subjects
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