Bipolar transistor manufacturing method
A method of manufacturing a bipolar transistor in an N-type semiconductor substrate, including the steps of depositing a first base contact polysilicon layer and doping it; depositing a second silicon oxide layer; forming in the first and second layers an opening; annealing to form a third thin oxid...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
14.01.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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