Bipolar transistor manufacturing method
A method of manufacturing a bipolar transistor in an N-type semiconductor substrate, including the steps of depositing a first base contact polysilicon layer and doping it; depositing a second silicon oxide layer; forming in the first and second layers an opening; annealing to form a third thin oxid...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
14.01.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Abstract | A method of manufacturing a bipolar transistor in an N-type semiconductor substrate, including the steps of depositing a first base contact polysilicon layer and doping it; depositing a second silicon oxide layer; forming in the first and second layers an opening; annealing to form a third thin oxide layer and harden the second oxide layer; implanting a P-type dopant; depositing a fourth silicon nitride layer; depositing a fifth silicon oxide layer and etching it; anisotropically etching the fifth, fourth, and third layers; performing cleanings during which the fifth layer is reetched and takes a flared profile; depositing a sixth polysilicon layer; and implanting an N-type dopant. |
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AbstractList | A method of manufacturing a bipolar transistor in an N-type semiconductor substrate, including the steps of depositing a first base contact polysilicon layer and doping it; depositing a second silicon oxide layer; forming in the first and second layers an opening; annealing to form a third thin oxide layer and harden the second oxide layer; implanting a P-type dopant; depositing a fourth silicon nitride layer; depositing a fifth silicon oxide layer and etching it; anisotropically etching the fifth, fourth, and third layers; performing cleanings during which the fifth layer is reetched and takes a flared profile; depositing a sixth polysilicon layer; and implanting an N-type dopant. |
Author | GRIS YVON TROILLARD GERMAINE |
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Snippet | A method of manufacturing a bipolar transistor in an N-type semiconductor substrate, including the steps of depositing a first base contact polysilicon layer... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | Bipolar transistor manufacturing method |
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