Apparatus for electrostatically maintaining subtrate flatness
An apparatus for holding a substrate on a support layer in a processing chamber. The apparatus is directed to a susceptor system for a processing chamber in which a substrate is electrostatically held essentially flat. The apparatus includes a substrate support and a support layer composed of a diel...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English |
Published |
31.12.2002
|
Edition | 7 |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | An apparatus for holding a substrate on a support layer in a processing chamber. The apparatus is directed to a susceptor system for a processing chamber in which a substrate is electrostatically held essentially flat. The apparatus includes a substrate support and a support layer composed of a dielectric material disposed on the substrate support. At least one lift pin is used for supporting the substrate relative to the support layer. A device is provided for moving each lift pin relative to the support layer. A device is also provided for producing a plasma within the processing chamber. |
---|---|
Bibliography: | Application Number: US20000714023 |