Method of making wafer having top and bottom emitting vertical-cavity lasers
A technique is described for determining the performance of substrate-side emitting VCSELs formed on a wafer. The technique involves forming top-emitting VCSELs on the same wafer as bottom-emitting VCSELs and then testing the top-emitting VCSELs and using the results to determine the performance of...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
26.11.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A technique is described for determining the performance of substrate-side emitting VCSELs formed on a wafer. The technique involves forming top-emitting VCSELs on the same wafer as bottom-emitting VCSELs and then testing the top-emitting VCSELs and using the results to determine the performance of the bottom-emitting VCSELs of the wafer. |
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Bibliography: | Application Number: US20010769024 |