System for receiving and retaining a substrate

• Main Authors: DAMM CHRISTOPH, PESCHEL THOMAS, RISSE STEFAN, KIRSCHSTEIN ULF-CARSTEN
• Format: Patent
• Language: English
• Published: 12.11.2002
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The invention refers to a receiving and supporting system for a substrate (17) in an exposure system, which is provided with a handling system for the supply of the substrate (17), with an electrostatic chuck arrangement (1) moveable in X, Y coordinates, for the support of the substrate (17) during the exposure, and with an exposure optic, from which a right angled particle radiation, in Z-direction is directed toward the substrate surface.In regard to the respective supporting system, at least a second electrostatic chuck arrangement (6) is provided, which-similar to the first chuck arrangement (1), for the support of the substrate (17) during the exposure, provides a bearing surface for the substrate, whereby the bearing surface of this second chuck arrangement (6) is positioned movable in Z coordinate. In regard to their supporting force, both chuck arrangements (1, 6) are arranged in such a manner, that the substrate (17) is securely positioned when being supported either on the first chuck arrangement (1) or when being supported exclusively on the second chuck arrangement (6).