Composition for positive photoresist
A photoresist composition is provided. The photoresist composition includes a polymer resin for forming a photoresist layer, a photosensitive chemical for changing solubility of the photoresist layer when exposed to some form of radiation, and 3-methoxybutyl acetate, 2-heptanone, and 4-butyrolactone...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
08.10.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A photoresist composition is provided. The photoresist composition includes a polymer resin for forming a photoresist layer, a photosensitive chemical for changing solubility of the photoresist layer when exposed to some form of radiation, and 3-methoxybutyl acetate, 2-heptanone, and 4-butyrolactone as a solvent. The composition has a good photosensitivity and remainder ratio, and no unpleasant odor. |
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Bibliography: | Application Number: US20000651114 |