Cleaning apparatus
An apparatus performs at least one of cleaning and drying a semiconductor wafer while rotating the semiconductor wafer. The apparatus has a rotating mechanism for rotating the semiconductor wafer, and a sensor for detecting a reference position such as a notch or an orientation flat of the semicondu...
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Main Author | |
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Format | Patent |
Language | English |
Published |
27.08.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An apparatus performs at least one of cleaning and drying a semiconductor wafer while rotating the semiconductor wafer. The apparatus has a rotating mechanism for rotating the semiconductor wafer, and a sensor for detecting a reference position such as a notch or an orientation flat of the semiconductor wafer. The semiconductor wafer may be stopped from rotating to align the reference position with a predetermined position based on an output signal from the sensor. |
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Bibliography: | Application Number: US19990238612 |