Technique to separate dose-induced vs. focus-induced CD or linewidth variation

A method of identifying a change in focus and a change in illumination from a best focus and a best dose at a region on a substrate corresponding to a point in the image field of a lithographic printing tool is disclosed. The method includes forming a feature having a first pitch and a feature havin...

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Bibliographic Details
Main Author NGUYEN KHANH B
Format Patent
LanguageEnglish
Published 02.07.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method of identifying a change in focus and a change in illumination from a best focus and a best dose at a region on a substrate corresponding to a point in the image field of a lithographic printing tool is disclosed. The method includes forming a feature having a first pitch and a feature having a second pitch at the region on the substrate, and identifying a linewidth of the features. The identified linewidths are then used to determine the change in focus from the best focus and the change in dose from the best dose which would produce both the first pitch feature and the second pitch feature at the region.
Bibliography:Application Number: US19990386980