Auxiliary gasline-heating unit in chemical vapor deposition
An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N2 gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH3)2]4, from being condensed and becoming a gasline contaminant w...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
05.03.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N2 gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH3)2]4, from being condensed and becoming a gasline contaminant when the mixture mixes with the TDMAT and a carrier gas. |
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Bibliography: | Application Number: US20010909498 |