Method of stabilizing anti-reflection coating layer

A method of stabilizing an anti-reflection coating (ARC) layer is disclosed. The method provides a substrate with a dielectric layer, a conductive layer, and the ARC layer formed thereon. The ARC layer is treated in an ultraviolet (UV) curing step prior to forming a photoresist layer over the ARC la...

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Bibliographic Details
Main Authors LEE KAN-YUAN, HORNG WEICHING, KO JOE, HONG GARY
Format Patent
LanguageEnglish
Published 24.04.2001
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A method of stabilizing an anti-reflection coating (ARC) layer is disclosed. The method provides a substrate with a dielectric layer, a conductive layer, and the ARC layer formed thereon. The ARC layer is treated in an ultraviolet (UV) curing step prior to forming a photoresist layer over the ARC layer, so that the specificity of the ARC layer is stabilized to allow an accurate pattern is replicated in the photoresist layer. A photomask with the desired pattern is provided, while a photolithographic process is then performed to transfer the pattern onto the wafer.
Bibliography:Application Number: US19990467284