Exposure apparatus and field stop thereof

An exposure apparatus has a field stop, disposed in a position conjugate to a reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions form...

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Bibliographic Details
Main Authors GOTO HIDEJI, YANAGIHARA MASAMITSU, HANAZAKI NORITSUGU, WATANABE TOMOYUKI
Format Patent
LanguageEnglish
Published 10.04.2001
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An exposure apparatus has a field stop, disposed in a position conjugate to a reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting positions of light reducing portions and relatively moving the two aperture members during the projection.
Bibliography:Application Number: US19990293953