Photoresist with novel photoactive compound

An unsymetrical photoactive compound having the formula where Z is hydrogen, a hydrocarbon having from 1 to 8 carbon atoms, or halogen; D is hydrogen or diazo-oxo-naphthalene-sulfonyl; n is equal to 1 to 4; R1, R5 and R6 are independently a hydrocarbon or halogen; R2 is the same as R1 or hydrogen; e...

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Bibliographic Details
Main Authors SANDFORD; HAROLD F, ZAMPINI; ANTHONY
Format Patent
LanguageEnglish
Published 18.04.2000
Edition7
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
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Summary:An unsymetrical photoactive compound having the formula where Z is hydrogen, a hydrocarbon having from 1 to 8 carbon atoms, or halogen; D is hydrogen or diazo-oxo-naphthalene-sulfonyl; n is equal to 1 to 4; R1, R5 and R6 are independently a hydrocarbon or halogen; R2 is the same as R1 or hydrogen; each R3 is the same as R2, hydroxyl or -OD; and each R4 is the same as R2 or another substituent provided that at least one R2, or one or both R4 is other than hydrogen, at least 2 Ds are diazo-oxo-sulfonyl group and at least 50 mole percent of the mixture conforms to the formula where n equals 1. The compounds of the invention are suitable for formation of storage stable photoresist compositions.
Bibliography:Application Number: US19970963778