Internally cooled target assembly for magnetron sputtering

An internally cooled target assembly for use in a magnetron sputtering apparatus is provided. The internally cooled target assembly includes a cooling plate that is configured to promote highly turbulent coolant flow through the target assembly to achieve efficient and uniform target cooling. The vo...

Full description

Saved in:
Bibliographic Details
Main Authors COCHRAN; RONALD R, JIANG; MINGWEI, HARRA; DAVID J, HARTSOUGH; LARRY D
Format Patent
LanguageEnglish
Published 16.11.1999
Edition6
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:An internally cooled target assembly for use in a magnetron sputtering apparatus is provided. The internally cooled target assembly includes a cooling plate that is configured to promote highly turbulent coolant flow through the target assembly to achieve efficient and uniform target cooling. The volume of coolant required to cool the target assembly is minimized.
Bibliography:Application Number: US19970832718