System for in-line monitoring of photo processing in VLSI fabrication
An integrated de-focus pattern provides an effective in-line monitor of de-focus and relative tilt for photo processing steps of integrated circuit wafers. The de-focus pattern is formed on an integrated circuit wafer in the vertical and horizontal spaces between integrated circuit chips. The de-foc...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
07.09.1999
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | An integrated de-focus pattern provides an effective in-line monitor of de-focus and relative tilt for photo processing steps of integrated circuit wafers. The de-focus pattern is formed on an integrated circuit wafer in the vertical and horizontal spaces between integrated circuit chips. The de-focus pattern has a number of different test patterns at different heights above the wafer surface. De-focus patterns are placed across the entire wafer surface. The de-focus patterns are formed at the same time the features of the circuit chips are formed. The de-focus patterns can be analyzed optically or using a scanning electron microscope. |
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Bibliography: | Application Number: US19970803352 |