Ion beam process for deposition of highly wear-resistant optical coatings

An ion beam deposition method is provided for manufacturing a coated substrate with improved wear-resistance, and improved lifetime. The substrate is first chemically cleaned to remove contaminants. Secondly, the substrate is inserted into a vacuum chamber onto a substrate holder, and the air therei...

Full description

Saved in:
Bibliographic Details
Main Authors MAHONEY; LEONARD JOSEPH, GALVIN; NORMAN DONALD, KIMOCK; FRED MICHAEL, PETRMICHL; RUDOLPH HUGO, VENABLE III; RAY HAYS, KNAPP; BRADLEY J
Format Patent
LanguageEnglish
Published 30.03.1999
Edition6
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:An ion beam deposition method is provided for manufacturing a coated substrate with improved wear-resistance, and improved lifetime. The substrate is first chemically cleaned to remove contaminants. Secondly, the substrate is inserted into a vacuum chamber onto a substrate holder, and the air therein is evacuated via pump. Then the substrate surface is bombarded with energetic ions from an ion beam source supplied from inert or reactive gas inlets to assist in removing residual hydrocarbons and surface oxides, and activating the surface. After sputter-etching the surface, a protective, wear-resistant coating is deposited by plasma ion beam deposition where a portion of the precursor gases are introduced into the ion beam downstream of the ion source, and hydrogen is introduced directly into the ion source plasma chamber. The plasma ion beam-deposited coating may contain one or more layers. Once the chosen coating thickness is achieved, deposition is terminated, vacuum chamber pressure is increased to atmospheric and the coated substrate products having wear-resistance greater than glass are removed from the chamber. These coated products may be ceramics, architectural glass, analytical instrument windows, automotive windshields, and laser bar code scanners for use in retail stores and supermarkets.
Bibliography:Application Number: US19960631170