Vertical LPCVD furnace with reversible manifold collar and method of retrofitting same

• Main Author: PERSYN; STEVEN C
• Format: Patent
• Language: English
• Published: 01.09.1998
• Edition: 6
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

A reversible manifold collar design for use in a vertical low pressure chemical vapor deposition (LPCVD) furnace incorporates first and second notches in opposing ends thereof such that one of the notches aligns with an exhaust port in the deposition chamber of the furnace irrespective of the installed orientation of the collar. As such, blockage of the exhaust port, which might otherwise increase deposition rates and/or decrease film uniformity, may be avoided. Also, a method of retrofitting a LPCVD furnace includes removing an existing manifold collar and replacing it with a reversible manifold collar such that one of a pair of notches therein is adapted to align with an exhaust port irrespective of the orientation of the collar.