Light senitive material having improved antistatic behavior

The invention relates to the use of a fluoropolymer and a fluorochemical surface active agent in combination for improving the antistatic behaviour of surfaces. In one embodiment, the invention provides a light-sensitive material possessing good initial antistatic properties and retaining good prope...

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Bibliographic Details
Main Authors BRANDON; MARC, DAMS; RUDOLPH J, ARREN; DIRK H. C
Format Patent
LanguageEnglish
Published 07.10.1997
Edition6
Subjects
AUXILIARY PROCESSES IN PHOTOGRAPHY
CINEMATOGRAPHY
ELECTROGRAPHY
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
HOLOGRAPHY
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
TECHNICAL SUBJECTS COVERED BY FORMER USPC
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS
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Summary:The invention relates to the use of a fluoropolymer and a fluorochemical surface active agent in combination for improving the antistatic behaviour of surfaces. In one embodiment, the invention provides a light-sensitive material possessing good initial antistatic properties and retaining good properties even after aqueous processing.
Bibliography:Application Number: US19950495818