Apparatus for cleaning semiconductor wafers

• Main Authors: BARTRAM; RONALD D, CHAI; JING, ERK; HENRY F, HOLLANDER; EUGENE R
• Format: Patent
• Language: English
• Published: 06.05.1997
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

A method of cleaning a semiconductor wafer comprises placing liquid in a bath with a gas-liquid-interface defined at the surface of the liquid. A semiconductor wafer is placed in the bath so that it is oriented in a generally upright position with at least part of the wafer being in the liquid and b...