Selected area adhesion and surface passivation of metal films

• Main Authors: GLAUNSINGER; WILLIAM, BAO; QINGCHENG, SORENSEN; IAN
• Format: Patent
• Language: English
• Published: 24.12.1996
• Edition: 6
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING; TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR

A thin film device having a selectively passivated surface is provided. An embodiment of the device is particularly suited to detection of chemical constituents by selective adsorption, where the selectively passivated surface is inert to the chemical constituent being detected. A method of fabrication of the device is also provided in which the selective passivation is achieved by selectively applying the metallic adhesive to the substrate. The migration of the metallic adhesive through the thin film layer is essentially normal to the surface of the substrate, thereby limiting the passivation of the thin film layer to the surface areas directly overlying the metallic adhesive.