Multi mask method for selective mask feature enhancement
The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overl...
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Main Author | |
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Format | Patent |
Language | English |
Published |
08.10.1996
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Abstract | The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overlay masks"), all of the features are the type normally enhanced. A composite pattern is printed into photoresist through successive exposure to the overlay masks. |
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AbstractList | The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overlay masks"), all of the features are the type normally enhanced. A composite pattern is printed into photoresist through successive exposure to the overlay masks. |
Author | NEISSER; MARK O |
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PublicationDateYYYYMMDD | 1996-10-08 |
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PublicationDecade | 1990 |
PublicationYear | 1996 |
RelatedCompanies | INTERNATIONAL BUSINESS MACHINES CORPORATION |
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Snippet | The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
Title | Multi mask method for selective mask feature enhancement |
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