Multi mask method for selective mask feature enhancement
The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overl...
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Main Author | |
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Format | Patent |
Language | English |
Published |
08.10.1996
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overlay masks"), all of the features are the type normally enhanced. A composite pattern is printed into photoresist through successive exposure to the overlay masks. |
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Bibliography: | Application Number: US19940269853 |