System and method for scene light source analysis

System and method for rapid measurement of an exposure light source and calculation of filter selection for proper color balanced exposure of a light sensitive medium includes measurement of the light source with a spectroradiometer and calculation of color log exposure differences for successive fi...

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Bibliographic Details
Main Authors SEHLIN; RICHARD C, MINA; RAMI, BOGDANOWICZ; MITCHELL J
Format Patent
LanguageEnglish
Published 10.09.1996
Edition6
Subjects
COLORIMETRY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
TESTING
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Summary:System and method for rapid measurement of an exposure light source and calculation of filter selection for proper color balanced exposure of a light sensitive medium includes measurement of the light source with a spectroradiometer and calculation of color log exposure differences for successive filters taken from a database list with the filter selection being based on a minimum overall difference value derived from the summation of the absolute values of the individual color log exposure differences.
Bibliography:Application Number: US19950391874