Low-velocity electron excited phosphor and method for producing same

• Main Authors: YONEZAWA; YOSHIHISA, ITOH; SHIGEO, TOKI; HITOSHI
• Format: Patent
• Language: English
• Published: 23.04.1996
• Edition: 6
• Subjects: ADHESIVES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; DYES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A low-velocity electron excited phosphor capable of exhibiting increased luminance and a method for producing the same. A matrix crystal for the phosphor is doped therein with an activator at implantation energy of 50 KeV by ion implantation, resulting in the activator entering a portion of the matrix crystal extending to a depth as small as 0.5 mu m from a surface thereof. Then, the phosphor is annealed for a reduced period of time as short as 10 seconds at a temperature of 900 DEG C. Such short-time annealing effectively prevents distribution of the activator in the matrix crystal formed during the implantation from being deeply spread into the matrix crystal by thermal diffusion. Thus, the activator concentratedly exists at only a portion of the matrix crystal in proximity to the surface thereof. Thus, the phosphor exhibits increased luminance as compared with a prior art, because luminescence of the phosphor is limited to the portion thereof in proximity to the surface.