Moisture removal and passivation of surfaces

The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of moisture, wherein the moisture removal and pas...

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Bibliographic Details
Main Authors LANGAN; JOHN G, JOHNSON; ANDREW D, FINE; STEPHEN M
Format Patent
LanguageEnglish
Published 02.01.1996
Edition6
Subjects
BLASTING
DRYING
DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
HEATING
LIGHTING
MECHANICAL ENGINEERING
WEAPONS
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Summary:The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of moisture, wherein the moisture removal and passivation is enhanced using an agent of the formula: RaSiXbYcZd where a =1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable. The moisture removal and passivation is conducted at less than 65 DEG C. and at least ambient pressure.
Bibliography:Application Number: US19940329029