Yield surface modeling methodology
A method for predicting yields for integrated circuit designs for given specification limits and process variations with respect to transistor parametric variations is based on a stastical analysis starting with response surface modeling techniques that relate desired circuit outcomes as a function...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
01.08.1995
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | A method for predicting yields for integrated circuit designs for given specification limits and process variations with respect to transistor parametric variations is based on a stastical analysis starting with response surface modeling techniques that relate desired circuit outcomes as a function of a set of defined independent variables. The response surfaces are converted to discrete Cpk surfaces for all combinations of the independent variables. The Cpk surfaces are next converted to discrete percent yield surfaces for each of the circuit outcomes which then are combined to provide a composite yield surface comprising all desired parametric operating points of the outcomes that may be used to predict the circuit yield. |
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Bibliography: | Application Number: US19950392664 |