Shearing optical element for interferometric analysis system

Method and apparatus for analyzing the deformation of an object resulting from the application of stress. A novel optical element is used to perform shearometric analysis upon a test object. The novel optical element has an overall pattern of first and second pluralities of regions having significan...

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Bibliographic Details
Main Authors GRANT; RALPH M, WRIGHT; FORREST
Format Patent
LanguageEnglish
Published 23.08.1994
Edition5
Subjects
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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Summary:Method and apparatus for analyzing the deformation of an object resulting from the application of stress. A novel optical element is used to perform shearometric analysis upon a test object. The novel optical element has an overall pattern of first and second pluralities of regions having significantly different indices of transmissivity. The pattern of variations causes pairs of light rays which are reflected from two distinct points on the test object at a divergent angle to emerge from the optical element so that they are nearly parallel. The nearly parallel rays are then received upon a photoelectrical sensing means such as a video camera or photoelectric array. Because the rays impinging thereon are nearly parallel, they may be adequately resolved by the photoelectric sensing means, thus enabling shearometric analysis to be performed electronically in a rapid and cost-effective manner.
Bibliography:Application Number: US19930084570