Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography

• Main Authors: JACOBSEN; STEPHEN C, DAVIS; CLARK, WOOD; JOHN E, WELLS; DAVID L
• Format: Patent
• Language: English
• Published: 21.04.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CLADDING OR PLATING BY SOLDERING OR WELDING; CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILSOF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; HOLOGRAPHY; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT; INSTRUMENT DETAILS; MACHINE TOOLS; MATERIALS THEREFOR; MEASURING; MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK; METAL-WORKING NOT OTHERWISE PROVIDED FOR; MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES; MICROSTRUCTURAL TECHNOLOGY; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS; REGULATING; SEMICONDUCTOR DEVICES; SOLDERING OR UNSOLDERING; TESTING; TRANSPORTING; WELDING; WORKING BY LASER BEAM

Apparatus for non-planar treatment of a workpiece utilizing exposure beam lithography includes a vacuum chamber (4), an exposure beam generator such as an electron beam generator (8) disposed in the chamber for directing a beam (12) towards a work location (16), a chuck (44) disposed in the chamber for holding and positioning the workpiece (40) at the work location, a rotary motorized stage (48) disposed in the chamber and responsive to first control signals for selectively rotating the chuck, and thus the workpiece, to thereby expose different areas of the workpiece to the beam, and a linear motorized stage (56) disposed in the chamber on which the rotary stage is mounted, said linear motor being responsive to second control signals for selectively moving the rotary stage and thus the chuck and workpiece in a linear direction which is generally parallel with the axis of rotation of the rotary stage. The workpiece is thus exposed over additional areas by operation of the linear stage. A controller supplies first and second control signals to the rotary stage and linear stage respectively to selectively effect the operation thereof.